ID | 62436 |
フルテキストURL | |
著者 |
Rao, Rama Venkata Krishna
Graduate School of Natural Science and Technology, Okayama University
Ranade, Ajinkya K.
Department of Physical Science and Engineering, Nagoya Institute of Technology
Desai, Pradeep
Department of Physical Science and Engineering, Nagoya Institute of Technology
Kalita, Golap
Department of Physical Science and Engineering, Nagoya Institute of Technology
Suzuki, Hiroo
Graduate School of Natural Science and Technology, Okayama University
Hayashi, Yasuhiko
Graduate School of Natural Science and Technology, Okayama University
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抄録 | Temperature-dependent studies of Ga2O3-based heterojunction devices are important in understanding its carrier transport mechanism, junction barrier potential, and stability at higher temperatures. In this study, we investigated the temperature-dependent device characteristics of the p-type gamma-copper iodide (gamma-CuI)/n-type beta-gallium oxide (beta-Ga2O3) heterojunctions, thereby revealing their interface properties. The fabricated gamma-CuI/beta-Ga2O3 heterojunction showed excellent diode characteristics with a high rectification ratio and low reverse saturation current at 298 K in the presence of a large barrier height (0.632 eV). The temperature-dependent device characteristics were studied in the temperature range 273-473 K to investigate the heterojunction interface. With an increase in temperature, a gradual decrease in the ideality factor and an increase in the barrier height were observed, indicating barrier inhomogeneity at the heterojunction interface. Furthermore, the current-voltage measurement showed electrical hysteresis for the reverse saturation current, although it was not observed for the forward bias current. The presence of electrical hysteresis for the reverse saturation current and of the barrier inhomogeneity in the temperature-dependent characteristics indicates the presence of some level of interface states for the gamma-CuI/beta-Ga2O3 heterojunction device. Thus, our study showed that the electrical hysteresis can be correlated with temperature-dependent electrical characteristics of the beta-Ga2O3-based heterojunction device, which signifies the presence of surface defects and interface states.
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キーワード | Gallium oxide
gamma-copper iodide
Heterojunction
Device
Temperature dependent
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発行日 | 2021-09-08
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出版物タイトル |
SN Applied Sciences
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巻 | 3巻
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号 | 10号
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出版者 | Springer International Publishing AG
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開始ページ | 796
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ISSN | 2523-3963
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資料タイプ |
学術雑誌論文
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言語 |
英語
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OAI-PMH Set |
岡山大学
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著作権者 | © The Author(s) 2021
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論文のバージョン | publisher
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DOI | |
Web of Science KeyUT | |
関連URL | isVersionOf https://doi.org/10.1007/s42452-021-04774-3
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ライセンス | http://creativecommons.org/licenses/by/4.0/
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Citation | Venkata Krishna Rao, R., Ranade, A.K., Desai, P. et al. Temperature-dependent device properties of γ-CuI and β-Ga2O3 heterojunctions. SN Appl. Sci. 3, 796 (2021). https://doi.org/10.1007/s42452-021-04774-3
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オープンアクセス(出版社) |
OA
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