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  <Article>
    <Journal>
      <PublisherName>Springer Science and Business Media LLC</PublisherName>
      <JournalTitle>Acta Medica Okayama</JournalTitle>
      <Issn>2041-1723</Issn>
      <Volume>17</Volume>
      <Issue>1</Issue>
      <PubDate PubStatus="ppublish">
        <Year>2026</Year>
        <Month/>
      </PubDate>
    </Journal>
    <ArticleTitle>Atomic imaging for hydrogen and boron aggregates in boron-doped diamond by spectro-photoelectron holography</ArticleTitle>
    <FirstPage LZero="delete">3482</FirstPage>
    <LastPage/>
    <Language>EN</Language>
    <AuthorList>
      <Author>
        <FirstName EmptyYN="N">Hiroto</FirstName>
        <LastName>Tomita</LastName>
        <Affiliation>Graduate School of Science and Technology, Nara Institute of Science and Technology</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Wataru</FirstName>
        <LastName>Hosoda</LastName>
        <Affiliation>Research Institute for Interdisciplinary Science, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Takumi</FirstName>
        <LastName>Taniguchi</LastName>
        <Affiliation>Research Institute for Interdisciplinary Science, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Hirokazu</FirstName>
        <LastName>Fujiwara</LastName>
        <Affiliation>Department of Advanced Materials Science, Graduate School of Frontier Sciences, The University of Tokyo</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Noriyuki</FirstName>
        <LastName>Kataoka</LastName>
        <Affiliation>Research Institute for Interdisciplinary Science, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Taisuke</FirstName>
        <LastName>Kageura</LastName>
        <Affiliation>Sensing Technology Research Institute, National Institute of Advanced Industrial Science and Technology</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Yoshihiko</FirstName>
        <LastName>Takano</LastName>
        <Affiliation>Research Center for Materials Nanoarchitectonics, National Institute for Materials Science</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Hiroshi</FirstName>
        <LastName>Kawarada</LastName>
        <Affiliation>Faculty of Science and Engineering, Waseda University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Tamio</FirstName>
        <LastName>Oguchi</LastName>
        <Affiliation>Center for Spintronics Research Network, The University of Osaka</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Takayoshi</FirstName>
        <LastName>Yokoya</LastName>
        <Affiliation>Research Institute for Interdisciplinary Science, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Tomohiro</FirstName>
        <LastName>Matsushita</LastName>
        <Affiliation>Graduate School of Science and Technology, Nara Institute of Science and Technology</Affiliation>
      </Author>
    </AuthorList>
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    <Abstract>The electrical properties of diamond are modulated by impurity doping. Isolated substitutional boron atoms introduce holes; however, the fraction of electrically inactive boron atoms increases at higher doping concentrations. This has been attributed to boron aggregation and hydrogen passivation, although their structural identification based on atomic arrangement has yet to be experimentally verified. Here we show the origin of multiple chemical states in homoepitaxially grown boron-doped diamond thin films by analyzing the atomic environment of boron using spectro-photoelectron holography. Our analysis identifies boron dimers and boron-hydrogen complexes, with hydrogen occupying different atomic sites that give rise to distinct chemical shifts. These results suggest that hydrogen incorporation during growth leads to passivation of boron acceptors. We demonstrate that photoelectron holography serves as a promising tool for imaging hydrogen as well as determining the atomic sites of dopants.</Abstract>
    <CoiStatement>No potential conflict of interest relevant to this article was reported.</CoiStatement>
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  </Article>
  <Article>
    <Journal>
      <PublisherName>Nature Portfolio</PublisherName>
      <JournalTitle>Acta Medica Okayama</JournalTitle>
      <Issn>2045-2322</Issn>
      <Volume>15</Volume>
      <Issue>1</Issue>
      <PubDate PubStatus="ppublish">
        <Year>2025</Year>
        <Month/>
      </PubDate>
    </Journal>
    <ArticleTitle>Local-structure insight into the improved superconducting properties of Pb-substituted La(O, F)BiS2: a photoelectron holography study</ArticleTitle>
    <FirstPage LZero="delete">8366</FirstPage>
    <LastPage/>
    <Language>EN</Language>
    <AuthorList>
      <Author>
        <FirstName EmptyYN="N">Yajun</FirstName>
        <LastName>Li</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Yusuke</FirstName>
        <LastName>Hashimoto</LastName>
        <Affiliation>Nara Institute of Science and Technology (NAIST)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Noriyuki</FirstName>
        <LastName>Kataoka</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Zexu</FirstName>
        <LastName>Sun</LastName>
        <Affiliation>Nara Institute of Science and Technology (NAIST)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Sota</FirstName>
        <LastName>Kawamura</LastName>
        <Affiliation>Nara Institute of Science and Technology (NAIST)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Hiroto</FirstName>
        <LastName>Tomita</LastName>
        <Affiliation>Nara Institute of Science and Technology (NAIST)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Taro</FirstName>
        <LastName>Setoguchi</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Soichiro</FirstName>
        <LastName>Takeuchi</LastName>
        <Affiliation>Nara Institute of Science and Technology (NAIST)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Shunjo</FirstName>
        <LastName>Koga</LastName>
        <Affiliation>Nara Institute of Science and Technology (NAIST)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Kohei</FirstName>
        <LastName>Yamagami</LastName>
        <Affiliation>Japan Synchrotron Radiation Research Institute (JASRI)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Yoshinori</FirstName>
        <LastName>Kotani</LastName>
        <Affiliation>Japan Synchrotron Radiation Research Institute (JASRI)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Satoshi</FirstName>
        <LastName>Demura</LastName>
        <Affiliation>Department of Physics, College of Science and Technology(CST), Nihon University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Kanako</FirstName>
        <LastName>Noguchi</LastName>
        <Affiliation>Tokyo University of Science</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Hideaki</FirstName>
        <LastName>Sakata</LastName>
        <Affiliation>Tokyo University of Science</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Tomohiro</FirstName>
        <LastName>Matsushita</LastName>
        <Affiliation>Nara Institute of Science and Technology (NAIST)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Takanori</FirstName>
        <LastName>Wakita</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Yuji</FirstName>
        <LastName>Muraoka</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Takayoshi</FirstName>
        <LastName>Yokoya</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
    </AuthorList>
    <PublicationType/>
    <ArticleIdList>
      <ArticleId IdType="doi"/>
    </ArticleIdList>
    <Abstract>Pb-substituted La(O, F)BiS2 (Pb-LaOFBiS2) exhibits improved superconducting properties and a resistivity anomaly around 100 K that is attributed to a structural transition. We have performed temperature(T)-dependent photoelectron holography (PEH) to study dopant incorporation sites and the local structure change across the anomaly. The PEH study of Pb-LaOFBiS2 provided evidence for the dominant incorporation sites of Pb and F: Pb atoms are incorporated into the Bi sites and F atoms are incorporated into the O site. No remarkable difference in the local structures around Pb and Bi atoms was observed. Across the temperature of the resistivity anomaly (T*), photoelectron holograms of Bi 4f changed. Comparisons of holograms with those of non-substituted LaOFBiS2 sample, as well as simulated holograms, suggested that (1), above T*, the tetragonal structure of Pb-LaOFBiS2 is different from the tetragonal structure of LaOFBiS2 and (2), below T*, the tetragonal structure still remains in Pb-LaOFBiS2. We discuss a possible origin of the difference in the structure above T* and the implication of the result below T*, which are necessary ingredients to understand the physical properties of Pb-LaOFBiS2.</Abstract>
    <CoiStatement>No potential conflict of interest relevant to this article was reported.</CoiStatement>
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  </Article>
  <Article>
    <Journal>
      <PublisherName>IOP Publishing</PublisherName>
      <JournalTitle>Acta Medica Okayama</JournalTitle>
      <Issn>0021-4922</Issn>
      <Volume>62</Volume>
      <Issue>12</Issue>
      <PubDate PubStatus="ppublish">
        <Year>2023</Year>
        <Month/>
      </PubDate>
    </Journal>
    <ArticleTitle>Photoelectron holographic evidence for the incorporation site of Se and suppressed atomic displacement of the conducting layer of La(O,F)BiSSe</ArticleTitle>
    <FirstPage LZero="delete">125001</FirstPage>
    <LastPage/>
    <Language>EN</Language>
    <AuthorList>
      <Author>
        <FirstName EmptyYN="N">YaJun</FirstName>
        <LastName>Li</LastName>
        <Affiliation>Engineering Research Center of Integrated Circuit Packaging and Testing, Ministry of Education, Tianshui Normal University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">ZeXu</FirstName>
        <LastName>Sun</LastName>
        <Affiliation>Nara Institute of Science and Technology (NAIST)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Noriyuki</FirstName>
        <LastName>Kataoka</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Taro</FirstName>
        <LastName>Setoguchi</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Yusuke</FirstName>
        <LastName>Hashimoto</LastName>
        <Affiliation>Nara Institute of Science and Technology (NAIST)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Soichiro</FirstName>
        <LastName>Takeuchi</LastName>
        <Affiliation>Nara Institute of Science and Technology (NAIST)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Shunjo</FirstName>
        <LastName>Koga</LastName>
        <Affiliation>Nara Institute of Science and Technology (NAIST)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Kazuhisa</FirstName>
        <LastName>Hoshi</LastName>
        <Affiliation>Department of Physics, Tokyo Metropolitan University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Yoshikazu</FirstName>
        <LastName>Mizuguchi</LastName>
        <Affiliation>Department of Physics, Tokyo Metropolitan University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Tomohiro</FirstName>
        <LastName>Matsushita</LastName>
        <Affiliation>Nara Institute of Science and Technology (NAIST)</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Takanori</FirstName>
        <LastName>Wakita</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Yuji</FirstName>
        <LastName>Muraoka</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Takayoshi</FirstName>
        <LastName>Yokoya</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
    </AuthorList>
    <PublicationType/>
    <ArticleIdList>
      <ArticleId IdType="doi"/>
    </ArticleIdList>
    <Abstract>La(O,F)BiS2-xSex is a layered material that is considered to be a candidate exotic superconductor as well as a promising thermoelectrical material. We performed soft X-ray photoelectron holography to study the Se incorporation site and the local atomic arrangement of the conducting layer. A comparison of the experimental holograms with the simulated holograms indicates that Se atoms preferentially occupy the S sites in the conducting Bi–S plane of La(O,F)BiS2. A comparison between the state-of-the-art holographic reconstructions of La(O,F)BiSSe and La(O,F)BiS2 suggests that Se substitution suppresses the displacement of S atoms in La(O,F)BiS2. These results provide photoelectron holographic evidence for the Se incorporation site and the Se-induced suppression of in-plane disorder.</Abstract>
    <CoiStatement>No potential conflict of interest relevant to this article was reported.</CoiStatement>
    <ObjectList>
      <Object Type="keyword">
        <Param Name="value">photoelectron holography</Param>
      </Object>
      <Object Type="keyword">
        <Param Name="value">La(O,F)BiS2-x Se x</Param>
      </Object>
      <Object Type="keyword">
        <Param Name="value">local structure</Param>
      </Object>
      <Object Type="keyword">
        <Param Name="value">dopant site</Param>
      </Object>
    </ObjectList>
    <ReferenceList/>
  </Article>
  <Article>
    <Journal>
      <PublisherName>IOP Publishing</PublisherName>
      <JournalTitle>Acta Medica Okayama</JournalTitle>
      <Issn>0953-8984</Issn>
      <Volume>33</Volume>
      <Issue>3</Issue>
      <PubDate PubStatus="ppublish">
        <Year>2020</Year>
        <Month/>
      </PubDate>
    </Journal>
    <ArticleTitle>Soft x-ray irradiation induced metallization of layered TiNCl</ArticleTitle>
    <FirstPage LZero="delete">035501</FirstPage>
    <LastPage/>
    <Language>EN</Language>
    <AuthorList>
      <Author>
        <FirstName EmptyYN="N">Noriyuki</FirstName>
        <LastName>Kataoka</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Masashi</FirstName>
        <LastName>Tanaka</LastName>
        <Affiliation>Graduate School of Engineering, Kyushu Institute of Technology</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Wataru</FirstName>
        <LastName>Hosoda</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Takumi</FirstName>
        <LastName>Taniguchi</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Shin-ichi</FirstName>
        <LastName>Fujimori</LastName>
        <Affiliation>Materials Sciences Research Center, Japan Atomic Energy Agency</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Takanori</FirstName>
        <LastName>Wakita</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Yuji</FirstName>
        <LastName>Muraoka</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
      <Author>
        <FirstName EmptyYN="N">Takayoshi</FirstName>
        <LastName>Yokoya</LastName>
        <Affiliation>Graduate School of Natural Science and Technology, Okayama University</Affiliation>
      </Author>
    </AuthorList>
    <PublicationType/>
    <ArticleIdList>
      <ArticleId IdType="doi"/>
    </ArticleIdList>
    <Abstract>We have performed soft x-ray spectroscopy in order to study the photoirradiation time dependence of the valence band structure and chemical states of layered transition metal nitride chloride TiNCl. Under the soft x-ray irradiation, the intensities of the states near the Fermi level (EF) and the Ti3+ component increased, while the Cl 2p intensity decreased. Ti 2p–3d resonance photoemission spectroscopy confirmed a distinctive Fermi edge with Ti 3d character. These results indicate the photo-induced metallization originates from deintercalation due to Cl desorption, and thus provide a new carrier doping method that controls the conducting properties of TiNCl.</Abstract>
    <CoiStatement>No potential conflict of interest relevant to this article was reported.</CoiStatement>
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  </Article>
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