start-ver=1.4 cd-journal=joma no-vol=29 cd-vols= no-issue=1 article-no= start-page=15 end-page=22 dt-received= dt-revised= dt-accepted= dt-pub-year=1994 dt-pub=19941130 dt-online= en-article= kn-article= en-subject= kn-subject= en-title= kn-title=Note on the Electronic Structure of C(60) Molecule en-subtitle= kn-subtitle= en-abstract= kn-abstract=A molecular orbital approach to the electronic structure of C(60) molecule is formulated on the basis of optimized bond orbital model and the stability of the truncated icosahedron structure is examined. en-copyright= kn-copyright= en-aut-name=TotsujiChieko en-aut-sei=Totsuji en-aut-mei=Chieko kn-aut-name=“Œ’ÒçŽ}Žq kn-aut-sei=“Œ’Ò kn-aut-mei=çŽ}Žq aut-affil-num=1 ORCID= en-aut-name=MatsubaraTakeo en-aut-sei=Matsubara en-aut-mei=Takeo kn-aut-name= kn-aut-sei= kn-aut-mei= aut-affil-num=2 ORCID= en-aut-name=ObuchiMasumi en-aut-sei=Obuchi en-aut-mei=Masumi kn-aut-name= kn-aut-sei= kn-aut-mei= aut-affil-num=3 ORCID= affil-num=1 en-affil= kn-affil=Department of Electrical and Electronic Engineering affil-num=2 en-affil= kn-affil=Okayama University of Science affil-num=3 en-affil= kn-affil=Okayama University of Science END start-ver=1.4 cd-journal=joma no-vol=29 cd-vols= no-issue=1 article-no= start-page=7 end-page=14 dt-received= dt-revised= dt-accepted= dt-pub-year=1994 dt-pub=19941130 dt-online= en-article= kn-article= en-subject= kn-subject= en-title= kn-title=Electronic States in Semiconductor Quantum Dot with Fluctuating Interfaces en-subtitle= kn-subtitle= en-abstract= kn-abstract=Effects of interface fluctuations on the electronic states in semiconductor quantum dots are analyzed on the basis of numerical solutions for ground state wave functions and energy eigenvalues. It is shown that the effective volume of confinement becomes smaller than the real volume of quantum dots due to fluctuation. This effect comes from the fact that the wave functions with larger characteristic wavelength are not able to deform themselves following the fluctuation of interfaces exactly. en-copyright= kn-copyright= en-aut-name= en-aut-sei= en-aut-mei= kn-aut-name=HiroyukiTachibana kn-aut-sei=Hiroyuki kn-aut-mei=Tachibana aut-affil-num=1 ORCID= en-aut-name=TotsujiHiroo en-aut-sei=Totsuji en-aut-mei=Hiroo kn-aut-name=“Œ’Ò_•v kn-aut-sei=“Œ’Ò kn-aut-mei=_•v aut-affil-num=2 ORCID= en-aut-name=NaraShigetoshi en-aut-sei=Nara en-aut-mei=Shigetoshi kn-aut-name=“Þ—Çdr kn-aut-sei=“Þ—Ç kn-aut-mei=dr aut-affil-num=3 ORCID= en-aut-name=TotsujiChieko en-aut-sei=Totsuji en-aut-mei=Chieko kn-aut-name=“Œ’ÒçŽ}Žq kn-aut-sei=“Œ’Ò kn-aut-mei=çŽ}Žq aut-affil-num=4 ORCID= affil-num=1 en-affil= kn-affil=Department of Electrical and Electronic Engineering affil-num=2 en-affil= kn-affil=Department of Electrical and Electronic Engineering affil-num=3 en-affil= kn-affil=Department of Electrical and Electronic Engineering affil-num=4 en-affil= kn-affil=Department of Electrical and Electronic Engineering END start-ver=1.4 cd-journal=joma no-vol=29 cd-vols= no-issue=1 article-no= start-page=23 end-page=34 dt-received= dt-revised= dt-accepted= dt-pub-year=1994 dt-pub=19941130 dt-online= en-article= kn-article= en-subject= kn-subject= en-title= kn-title=Study on Water Quality of Surface Runoff and Groundwater Runoff on the Basis of Separation by a Numerical Filter en-subtitle= kn-subtitle= en-abstract= kn-abstract=In this study we investigated the water quality of surface runoff and groundwater runoff from the basins of the Yodo River and the Asahi River based on that separated by a numerical filter. The water quality of the surface runoff is greatly different from the groundwater runoff. The tendency of concentration change in accordance with river discharges is different from each other. The water qtiality of groundwater runoff changes with river discharges clockwise in many cases. The differences of COD and SS originating from those of population and industrial activities in each basin are found in the lower SS concentrations of the surface runoff and the COD cencentrations of the groundwater runoff. The nutrients and chlorine ion were investigated, too. en-copyright= kn-copyright= en-aut-name=KawaraOsami en-aut-sei=Kawara en-aut-mei=Osami kn-aut-name= kn-aut-sei= kn-aut-mei= aut-affil-num=1 ORCID= en-aut-name= en-aut-sei= en-aut-mei= kn-aut-name=FukumotoKohji kn-aut-sei=Fukumoto kn-aut-mei=Kohji aut-affil-num=2 ORCID= affil-num=1 en-affil= kn-affil=Department of Environmental and Civil Engineering, Faculty of Environmental Science and Technology affil-num=2 en-affil= kn-affil=Tottori Prefectural Office END start-ver=1.4 cd-journal=joma no-vol=29 cd-vols= no-issue=1 article-no= start-page=1 end-page=6 dt-received= dt-revised= dt-accepted= dt-pub-year=1994 dt-pub=19941130 dt-online= en-article= kn-article= en-subject= kn-subject= en-title= kn-title=Scribing of Ceramie Circuit Board with Q-Switched NdFYAG Laser en-subtitle= kn-subtitle= en-abstract= kn-abstract=Scribing of copper coated alumina ceramic board with Q-switched YAG laser used for the maskless direct patterning of circuit@board is experimentally investigated, which leads to efficient production of trial circuit board. Better dividing of alumina circuit board 655ƒÊm in thickness can be attained by the scribing of about 100ƒÊm depth. Higher repetition frequency of laser irradiation leads to smaller notch angle and lower breaking load. en-copyright= kn-copyright= en-aut-name=UnoYoshiyuki en-aut-sei=Uno en-aut-mei=Yoshiyuki kn-aut-name= kn-aut-sei= kn-aut-mei= aut-affil-num=1 ORCID= en-aut-name=KubotaShin-ichiro en-aut-sei=Kubota en-aut-mei=Shin-ichiro kn-aut-name= kn-aut-sei= kn-aut-mei= aut-affil-num=2 ORCID= en-aut-name=YokomizoSeiichi en-aut-sei=Yokomizo en-aut-mei=Seiichi kn-aut-name= kn-aut-sei= kn-aut-mei= aut-affil-num=3 ORCID= en-aut-name=OgataKojiro en-aut-sei=Ogata en-aut-mei=Kojiro kn-aut-name= kn-aut-sei= kn-aut-mei= aut-affil-num=4 ORCID= en-aut-name=TadaNobuhiko en-aut-sei=Tada en-aut-mei=Nobuhiko kn-aut-name= kn-aut-sei= kn-aut-mei= aut-affil-num=5 ORCID= affil-num=1 en-affil= kn-affil=Department of Mechanical Engineering affil-num=2 en-affil= kn-affil=Industrial Technology Center of Okayama Prefecture affil-num=3 en-affil= kn-affil=Industrial Technology Center of Okayama Prefecture affil-num=4 en-affil= kn-affil=Hitachi Construction Machinery Co., Ltd affil-num=5 en-affil= kn-affil=Hitachi Construction Machinery Co., Ltd END