| ID | 34174 |
| FullText URL | |
| Author |
Kondo, Kazuo
Ohgishi, Atsufumi
Tanaka, Zennosuke
|
| Abstract | The incorporation mechanism of SiO2 particles into zinc electrodeposit is discussed. The SiO2 particles precipitate in two ways on the (00-1)(eta) of zinc electrodeposit: by lined up particles along the laterally growing macrosteps on the (00.1)(eta) and by randomly dispersed particles on the (00.1)(eta). These particles incorporate into the electrodeposits by following two processes. The sidewalls of particles are incorporated into the macrosteps at the edge of (00.1)(eta). The bottom of randomly dispersed particles are incorporated into the (00.1)(eta) probably by the atomic steps. (C) 2000 The Electrochemical Society. |
| Keywords | atomic-force microscopy
iron binary alloy
zinc
morphology microstructure
|
| Note | Digital Object Identifer:10.1149/1.1393577
Published with permission from the copyright holder. This is the institute's copy, as published in Journal of the Electrochemical Society, July 2000, Volume 147, Issue 7, Pages 2611-2613. Publisher URL:http://dx.doi.org/10.1149/1.1393577 Direct access to Thomson Web of Science record Copyright © 2000 The Electrochemical Society, Inc. All rights reserved. |
| Published Date | 2000-07
|
| Publication Title |
Journal of the Electrochemical Society
|
| Volume | volume147
|
| Issue | issue7
|
| Start Page | 2611
|
| End Page | 2613
|
| Content Type |
Journal Article
|
| language |
English
|
| Refereed |
True
|
| DOI | |
| Web of Science KeyUT | |
| Submission Path | physical_and_theoretical_chemistry/12
|
