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ID 34181
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Author
Mu, Daobin
Kondo, Kazuo
Maeda, Junpei
Abstract

Cu-core Pb-free solder bumps were developed by electrodeposition in combination with photolithography. A bump with a pitch of 100 mum and a diam of 50 mum was successfully achieved with dry film resist (80 mum thick) under optimum process conditions, and the bumps reached the target height of 50 6 5 mm. The adoption of a dummy pattern improved the height uniformity of the bumps. Pull test results showed that the shear strength of the Cu bump (around 45 gf) was obtained by the soft-etching pretreatment of the Cu foil surface. Sn-Zn, Sn-Ag, Sn-Cu, and Sn-Bi platings were deposited as Pb-free solders with near-eutectic compositions. In particular, the interface properties of Sn-Zn solder plating/Cu were investigated after reflowing in this study, as well as the effect of Ni plating as an under ball metallurgy layer on compound formation at the interface. It was found that a compound of Y-Cu5Zn8 layer existed in the interface of the reflowed Sn-Zn plating/Cu. The Ni plating layer inhibited the formation of the interface Y-Cu5Zn8 compound with reflowing. (C) 2004 The Electrochemical Society.

Keywords
electrodeposited copper bumps
shape evolution
lead
alloys
Note
Digital Object Identifer:10.1149/1.1830354
Published with permission from the copyright holder. This is the institute's copy, as published in Journal of the Electrochemical Society, June 2004, Volume 151, Issue 7, Pages 514-518.
Publisher URL:http://dx.doi.org/10.1149/1.1830354
Direct access to Thomson Web of Science record
Copyright © 2004 The Electrochemical Society, Inc. All rights reserved.
Published Date
2004-6
Publication Title
Journal of the Electrochemical Society
Volume
volume151
Issue
issue7
Start Page
514
End Page
518
Content Type
Journal Article
language
English
Refereed
True
DOI
Web of Science KeyUT
Submission Path
physical_and_theoretical_chemistry/17