REPO

Memoirs of the Faculty of Engineering, Okayama University volume12
1978-02-25 発行

Parameters for Analysis on Distributed Circuit Properties of Etched Alunimum Oxide Film

Yamamoto Tatsuma
Yamamoto Yoshitake
Nishida Hideki
Yasuhara Kiyotaka
Publication Date
1978-02-25
Abstract
The distributed circuit properties based on pores in the etched aluminum oxide film of the electrolytic capacitor have been analysed by the mathematical equation. This paper proposes the selection and the determining method of the parameters appearing in the analysis.
ISSN
0475-0071
NCID
AA00733903
NAID